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Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
Line 147: Line 147:
* Boron Glass: 85.4° [84.4°]
* Boron Glass: 85.4° [84.4°]
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Coming soon:
Fast recipe [standard recipe]:
Fast recipe [standard recipe]:
* Si (native oxide): xx° [xx°]
* Si (native oxide): 72.9° [81.0°]
* SiO<sub>2</sub> (110 nm): xx° [xx°]
* SiO<sub>2</sub> (110 nm): 71.0° [79.7°]
* Boron Glass: xx° [xx°]
* Boron Glass: 90.7° [96.2°]
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