Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
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Coming soon: | Coming soon: | ||
Fast recipe [standard recipe] | Fast recipe [standard recipe]: | ||
* Si (native oxide): xx° [xx°] | * Si (native oxide): xx° [xx°] | ||
* SiO<sub>2</sub> (110 nm): xx° [xx°] | * SiO<sub>2</sub> (110 nm): xx° [xx°] | ||