Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
| Line 148: | Line 148: | ||
| | | | ||
Coming soon: | Coming soon: | ||
Fast [standard] | |||
Fast recipe [standard recipe] | |||
* Si (native oxide): xx° [xx°] | * Si (native oxide): xx° [xx°] | ||
* SiO<sub>2</sub> (110 nm): xx° [xx°] | * SiO<sub>2</sub> (110 nm): xx° [xx°] | ||