Jump to content

Specific Process Knowledge/Lithography/Baking: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,931 edits
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,931 edits
Line 53: Line 53:
Maximum 110°C
Maximum 110°C
|
|
Maximum xxx°C
Maximum temperature is hotplate dependent
|
|
Fixed at various recipe dependent temperatures.
Fixed at various recipe dependent temperatures.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Baking"