Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

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 |style="background:LightGrey; color:black"|Contact angle
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-standard recipe 82° (on SiO<sub>2</sub>)
+* Si (native oxide): 86.7°
+* SiO<sub>2</sub> (110 nm): 85.6°
-Coming soon:
+* Boron Glass: 94.5°
-* Si (native oxide): xx°
-* SiO<sub>2</sub> (110 nm): xx°
-* Boron Glass: xx°
 |
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-° - 90°; standard recipe 82° (on SiO<sub>2</sub>)
+Track 1 (Track 2):
+* Si (native oxide): 74.9° (73.3°)
-Coming soon:
+* SiO<sub>2</sub> (110 nm): 81.8° (73.4°)
-* Si (native oxide): xx°
+* Boron Glass: 85.4° (84.4°)
-* SiO<sub>2</sub> (110 nm): xx°
-* Boron Glass: xx°
 |