Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

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-* HMDS priming
+* HMDS priming only
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 * HMDS priming only
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 standard recipe 82° (on SiO<sub>2</sub>)
+Coming soon:
+* Si (native oxide): xx°
+* SiO2 (100 nm): xx°
+* Boron Glass: xx°
 |
+Coming soon:
+* Si (native oxide): xx°
+* SiO2 (100 nm): xx°
+* Boron Glass: xx°
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 ° - 90°; standard recipe 82° (on SiO<sub>2</sub>)
+Coming soon:
+* Si (native oxide): xx°
+* SiO2 (100 nm): xx°
+* Boron Glass: xx°
 |
+Coming soon:
+* Si (native oxide): xx°
+* SiO2 (100 nm): xx°
+* Boron Glass: xx°
 |-