Specific Process Knowledge/Etch/Etching of Silicon: Difference between revisions
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![[Specific Process Knowledge/Etch/ | ![[Specific Process Knowledge/Etch/Si Etch|Si Etch]] | ||
![[Specific Process Knowledge/Etch/Wet Polysilicon Etch|Wet PolySilicon etch]] | ![[Specific Process Knowledge/Etch/Wet Polysilicon Etch|Wet PolySilicon etch]] | ||
![[Specific Process Knowledge/Etch/RIE (Reactive Ion Etch)|RIE (Reactive Ion Etch)]] | ![[Specific Process Knowledge/Etch/RIE (Reactive Ion Etch)|RIE (Reactive Ion Etch)]] | ||
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!Substrate size | !Substrate size | ||
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*<nowiki>#</nowiki>25 wafers of 100mm in | *<nowiki>#</nowiki>25 wafers of 100mm or 150nm in Si Etch 1 & 2 | ||
*<nowiki>#</nowiki>25 wafers of 100mm or 150nm and smaller samples in Si Etch 3 (fume hood) | |||
*<nowiki>#</nowiki>25 wafers of 100mm or | |||
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*<nowiki>#</nowiki>25 100 mm wafers in our 100mm bath | *<nowiki>#</nowiki>25 100 mm wafers in our 100mm bath | ||
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*Silicon Nitride | *Silicon Nitride | ||
*Silicon Oxynitride | *Silicon Oxynitride | ||
*Other materials (only in " | *Other materials (only in "Si Etch 3 (fume hood)) | ||
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*Silicon | *Silicon | ||