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Specific Process Knowledge/Etch/III-V ICP/InP-InGaAsP-InGaAs: Difference between revisions

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image:InP_Etch_1.jpg|
image:InP_Etch_1.jpg|
image:InP_Etch_1 1.jpg|
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</gallery>
==InP etching June 2018==
===With InP piece on Si carrier===
InP piece patterned with SiO2. The pice was etched on topof a Siwafer with out bonding. The InP etch was used.
<gallery>
caption="Result of InP etching." widths="300px" heights="200px" perrow="5">
Image:S1_00.jpg
Image:S1_30dg_01.jpg
Image:S1_30dg_02.jpg
Image:S1_30dg_03.jpg
Image:S1_30dg_04.jpg
Image:S1_30dg_05.jpg
Image:S1_30dg_06.jpg
Image:S1_30dg_07.jpg
Image:S1_30dg_08.jpg
Image:S1_30dg_09.jpg
Image:S1_30dg_10.jpg
Image:S1_30dg_midt_11.jpg
Image:S1_30dg_midt_12.jpg
Image:S1_30dg_midt_13.jpg
Image:S1_30dg_midt_14.jpg
</gallery>
</gallery>