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Specific Process Knowledge/Bonding/Anodic bonding: Difference between revisions

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===Bonding procedure===
===Bonding procedure===
*If the wafers are to be alinged remeber to put the Si wafers in first (Si wafer closest to the chuck).
*If the wafers are to be aligned remember to put the Si wafers in first (Si wafer closest to the chuck).
*If the wafers are just stacket on top of each other remeber to put the Si bellow (Si wafer closest to the chuck).
*If the wafers are just stacked on top of each other remember to put the Si below (Si wafer closest to the chuck).
*Align the wafers
*Align the wafers
*Place the chuck and graphite electrode in the chamber.
*Place the chuck and graphite electrode in the chamber.
*Close the chamber.
*Close the chamber.
*Turn the µm screw on top of the chamber to set the desired stack height.
*Turn the µm screw on top of the chamber to set the desired stack height.