Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 172: | Line 172: | ||
|Positive | |Positive | ||
|[http://www.allresist.com AllResist] | |[http://www.allresist.com AllResist] | ||
|Approved, not tested yet. Used for trilayer ( | |Approved, not tested yet. Used for trilayer (PE-free) resist-stack or double-layer lift-off resist stack. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information. | ||
|[[media:AR_P617.pdf|AR_P617.pdf]] | |[[media:AR_P617.pdf|AR_P617.pdf]] | ||
|See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u> | |See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u> | ||