Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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*The maximum field-size without stitching is 1000µm x 1000µm. | *The maximum field-size without stitching is 1000µm x 1000µm. | ||
*The machine has cassettes that can contain either 6 wafers of 2” in size, 2 or 3 wafers of 4” in size, 1 wafer of 6” in size, 1 wafer of 8” in size, 4 chips of different sizes(slot sizes 4 mm, 8 mm, 12 mm, and 20 mm) | *The machine has cassettes that can contain either 6 wafers of 2” in size, 2 or 3 wafers of 4” in size, 1 wafer of 6” in size, 1 wafer of 8” in size, 4 chips of different sizes(slot sizes 4 mm, 8 mm, 12 mm, and 20 mm) | ||
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[[File:colomn.png|400px]][[File:colomn2.png|400px]] | [[File:colomn.png|400px]][[File:colomn2.png|400px]] | ||
== Rough estimation of exposure time == | == Rough estimation of exposure time == | ||
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