Specific Process Knowledge/Lithography/mrEBL6000: Difference between revisions
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|[[media:Process_Flow_mrEBL6000.docx|Process_Flow_mrEBL6000.docx]] | |[[media:Process_Flow_mrEBL6000.docx|Process_Flow_mrEBL6000.docx]] | ||
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mrEBL6000 works as a negative e-beam resist but is also UV sensitive, why resist and coated wafers should be kept in yellow rooms only. When carrying the wafers to the e-beam writer, use a black or blue box for protection. While mounting the wafers in the e-beam cassettes, you can turn off the white light in the e-beam room and turn on the yellow light which is located above the pre-aligner setup. | mrEBL6000 works as a negative e-beam resist but is also UV sensitive, why resist and coated wafers should be kept in yellow rooms only. When carrying the wafers to the e-beam writer, use a black or blue box for protection. While mounting the wafers in the e-beam cassettes, you can turn off the white light in the e-beam room and turn on the yellow light which is located above the pre-aligner setup. | ||
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== 3 week project on mrEBL6000 by William Tiddi == | == 3 week project on mrEBL6000 by William Tiddi == | ||