Specific Process Knowledge/Lithography/mrEBL6000: Difference between revisions
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==Contrast Curve== | ==Contrast Curve== | ||
The contrast curve is measured on lines 100 nm in width, exposed with doses in the range of 6- | The contrast curve is measured on lines 100 nm in width, exposed with doses in the range of 6-63 µC/cm2. After exposure, the sample has been post-exposure baked 5 min @ 110 degree C. Development is performed with mr-DEV 600 in 40s followed by an IPA rinse 60s. | ||
These measurements are performed by WILTID April 2015. | These measurements are performed by WILTID April 2015. | ||