Specific Process Knowledge/Lithography/CSAR: Difference between revisions
No edit summary |
|||
| Line 267: | Line 267: | ||
|} | |} | ||
<br clear="all"/> | |||
== Development == | |||
Many resists can be developed in different developers, CSAR can be developed in: AR 600-546, AR 600-548, ZED N-50 and mix of MIBK and IPA among others. | |||
CSAR and ZEP520A are in principle the same chemical, however the pretreatment (filtration and temperature control) can differ. | |||
Some users have reported residues and residual layers when using ZED N-50 on CSAR and viceverca, hence we recommend to use AR 600-546 or AR 600-548 (3 times stronger) to develop CSAR and not ZED N-50. | |||
When this is said some users still observe residues when using AR 600-546, "'''All resist'''" have recommended to use 3-5s, dip in pure MIBK to remove residues. | |||
<br clear="all"/> | <br clear="all"/> | ||