Specific Process Knowledge/Lithography/mrEBL6000: Difference between revisions

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== 3 week project on mrEBL6000 by William Tiddi ==
== 3 week project on mrEBL6000 by William Tiddi ==


mrEBL6000 was studied April 2015 by William Tiddi; the report can be found here: |[[media:Report (2).pdf‎]]
mrEBL6000 was studied April 2015 by William Tiddi; the report can be found [[media:Report (2).pdf|here‎]].





Revision as of 11:00, 12 July 2016

Resist Polarity Manufacturer Comments Technical reports Developer Rinse Remover Process flows (in docx-format)
mr EBL 6000.1 Positive MicroResist Standard negative resist mrEBL6000 processing Guidelines.pdf‎ mr DEV IPA mr REM Process_Flow_mrEBL6000.docx‎





3 week project on mrEBL6000 by William Tiddi

mrEBL6000 was studied April 2015 by William Tiddi; the report can be found here‎.




Spin Curve

The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only.

9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers.


MicroResist mr EBL 6000. Spin coated on Spin Coater: Manual LabSpin A-5, WILTID, 2015. Softbake 3 min @ 110 degC.
Spin Speed [rpm] Thickness [nm] St Dev
2000 103 0.5
3000 88 0.4
4000 78 0.4
5000 71 0.7
6000 68 0.5
7000 66 0.6
MicroResist mr EBL 6000 diluted 1:1 in anisole. Spin coated on Spin Coater: Manual LabSpin A-5, WILTID, 2015. Softbake 3 min @ 110 degC.
Spin Speed [rpm] Thickness [nm] St Dev
2000 50 0.2
3000 42 0.5
4000 38 0.5
5000 34 0.3
6000 32 0.3
7000 32 0.3