Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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=== CSAR 6200.18 === | === CSAR 6200.18 === | ||
100 nm lines in ~900 nm thick CSAR has been developed with AR-600-546 (standard CSAR developer) at room temperature. | |||
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!colspan="5"|CSAR Contrast Curve, Processed by TIGRE, JUNE 2016 | |||
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|-style="background:WhiteSmoke; color:black" | |||
!Resist | |||
!Spin Coat | |||
!E-beam exposure | |||
!Development | |||
!Characterisation | |||
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|-style="background:WhiteSmoke; color:black" | |||
|CSAR AR-P6200.18 AllResist | |||
|08-02-2016, LabSpin E-5, 2000 rpm, 60s, softbaked 60s @ 205 degC | |||
|09-02-2016, JBX9500 E-2, 2nA aperture 5, doses 40-600 µC/cm2, 100 nm lines and 300 nm spaces | |||
|11-02-2016, Fumehood E-4, AR-600-546, rinsed in IPA 60s. | |||
|02-03-2016 SEM Supra 2, 10 keV | |||
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=== Dark Erosion === | === Dark Erosion === | ||