Specific Process Knowledge/Lithography/Strip: Difference between revisions

@@ Line 8: / Line 8: @@
 |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Plasma Asher 2|Plasma Asher 2]]</b>
 |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#III-V Plasma Asher|III-V Plasma Asher]]</b>
-|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Rough and Fine Strip|Rough and Fine Strip]]</b>
+|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Rough and Fine Strip|Resist strip]]</b>
 |style="background:WhiteSmoke; color:black"|<b>[[Specific Process Knowledge/Lithography/LiftOff|Lift-off]]</b>
@@ Line 23: / Line 23: @@
 Resist strip, no metal
 |style="background:WhiteSmoke; color:black"|
-Resist strip or lift-off
+Lift-off
 |-
@@ Line 78: / Line 78: @@
 *NA
 |style="background:WhiteSmoke; color:black"|
-*Acetone
+*NMP (Remover 1165)
+*Rinse in IPA
 |style="background:WhiteSmoke; color:black"|
-*Acetone
 *NMP (Remover 1165)
+*Rinse in IPA
 |-
@@ Line 102: / Line 103: @@
 |style="background:WhiteSmoke; color:black"|
 *1 - 25 100 mm wafers
+*1 - 25 150 mm wafers
 |style="background:WhiteSmoke; color:black"|
 *1 - 25 100 mm wafers
+*1 - 25 150 mm wafers
 |-