Specific Process Knowledge/Wafer and sample drying/Critical Point Dryer: Difference between revisions
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[[Image:SiN dried air.jpg|350x350px|left|thumb|Dried in air: most cantilevers are bended.]] | [[Image:SiN dried air.jpg|350x350px|left|thumb|Dried in air: most cantilevers are bended.]] | ||
'''Dried in air''': most cantilevers are bended. | '''Dried in air''': most cantilevers are bended. | ||
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'''Dried with Critical Point Dryer'''. The cantilevers are free hanging, and have not bended. The dimensions of the cantilevers are 100 x 710 µm, and the thickness is about 0.5 µm. | '''Dried with Critical Point Dryer'''. The cantilevers are free hanging, and have not bended. The dimensions of the cantilevers are 100 x 710 µm, and the thickness is about 0.5 µm. | ||
[[Image:SiN cantilever dried CPD nr7.jpg|350x350px|left|thumb|Dried with Critical Point Dryer.]] | [[Image:SiN cantilever dried CPD nr7.jpg|350x350px|left|thumb|Dried with Critical Point Dryer.]] | ||
'''Dried with the Critical Point Dryer'''. The cantilevers structures are free hanging after the drying. | '''Dried with the Critical Point Dryer'''. The cantilevers structures are free hanging after the drying. | ||
An acknowledgment goes to Tom Larsen, Nanoprobes, DTU Nanotech, who provided the pictures. | An acknowledgment goes to Tom Larsen, Nanoprobes, DTU Nanotech, who provided the pictures. | ||