Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic: Difference between revisions
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! width="40" | Coil | ! width="40" | Coil | ||
! width="40" | Platen | ! width="40" | Platen | ||
! width=" | ! width="80" | SEM images of different runs | ||
! width="40" | Keywords | ! width="40" | Keywords | ||
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| 400 <!--Coil power --> | | 400 <!--Coil power --> | ||
| 3 <!--Platen power --> | | 3 <!--Platen power --> | ||
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic/isoslow1|Click ]] <!-- link processes --> | | [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic/isoslow1|'''Click HERE!''' ]] <!-- link processes --> | ||
| NA <!--Keywords --> | | NA <!--Keywords --> | ||
|- | |- | ||
|} | |} | ||
Revision as of 09:57, 24 June 2016
Isotropic etching in silicon on the ICP Metal Etch
| Recipe | Step | Temp. | Time | Pres. | Hardware | Gasses | RF powers | Observations | |||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| SF6 | O2 | C4F8 | Ar | CF4 | H2 | CH4 | BCl3 | Cl2 | HBr | Coil | Platen | SEM images of different runs | Keywords | ||||||
| isoslow1 | A | 20 | - | 90 | - | 50 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 400 | 3 | Click HERE! | NA |