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Specific Process Knowledge/Etch/Etching of Bulk Glass: Difference between revisions

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*~800 nm/min (non-patterned silica, slow stirring)
*~800 nm/min (non-patterned silica, slow stirring)
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*~3,9 800 nm/min Typically 40-120 nm/min can be increased or decreased by using other recipe parameters.  
*~3,9 µm/min   
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