Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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== E-beam resists in the cleanroom == | == E-beam resists in the cleanroom == | ||
[[File:bottle.jpg|400px|right]] | |||
We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. | We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. | ||
* Find a blue-capped glass bottle in the cupboard next to office | * Find a blue-capped glass bottle in the cupboard next to office 055 in 346 (outside the cleanroom). | ||
* Bring the bottle inside gowning; clean it thoroughly '''on the outside''' with water or alcohol | * Bring the bottle inside gowning; clean it thoroughly '''on the outside''' with water or alcohol | ||
* Bring the bottle to a fumehood inside the cleanroom; clean the bottle and the lid thoroughly '''on the inside''' with the main solvent of your resist. For CSAR, ZEP, mr EBL, and most PMMAs, it is anisole. If in doubt which solvent your e-beam resist is diluted in, read the MSDS of the resist to be found [http://kemibrug.dk/searchpage/ here]. | * Bring the bottle to a fumehood inside the cleanroom; clean the bottle and the lid thoroughly '''on the inside''' with the main solvent of your resist. For CSAR, ZEP, mr EBL, and most PMMAs, it is anisole. If in doubt which solvent your e-beam resist is diluted in, read the MSDS of the resist to be found [http://kemibrug.dk/searchpage/ here]. | ||