Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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The disposable pipettes need to be thoroughly cleaned with a N2 gun before use. After some trainning, you can obtain particle-free 4" wafers if bottle and pipette (and spin coater) are properly cleaned. | The disposable pipettes need to be thoroughly cleaned with a N2 gun before use. After some trainning, you can obtain particle-free 4" wafers if bottle and pipette (and spin coater) are properly cleaned. | ||
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== E-beam resists and Process flow == | == E-beam resists and Process flow == | ||