Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus/Isotropic/mediumiso1: Difference between revisions

Jmli (talk | contribs)
Created page with " {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process runs''' |- ! rowspan="2" width="40"| Date ! colspan="4" width="120"| Substrate Informat..."
 
Jmli (talk | contribs)
No edit summary
Line 32: Line 32:
[[file:S003961-04.jpg |120px|frameless ]]
[[file:S003961-04.jpg |120px|frameless ]]
[[file:S003961-05.jpg |120px|frameless ]]
[[file:S003961-05.jpg |120px|frameless ]]
|-
| 6/6-2016
| 6"
| travka35 wafer 1.5 µm AZ
| Si / 35 %
| Pegasus/jmli
|
| standard/danchip/mediumiso1 2:00 minutes
| S006534
|
|
[[file:S006534 064.jpg |120px|frameless ]]
[[file:S006534 065.jpg |120px|frameless ]]
[[file:S006534 067.jpg |120px|frameless ]]
[[file:S006534 068.jpg |120px|frameless ]]
|-
| 6/6-2016
| 6"
| travka35 wafer 1.5 µm AZ
| Si / 35 %
| Pegasus/jmli
|
| standard/danchip/mediumiso1 4:00 minutes
| S006535
|
|
[[file:S006535 066.jpg |120px|frameless ]]
[[file:S006535069.jpg |120px|frameless ]]
[[file:S006534 067.jpg |120px|frameless ]]
[[file:S006534 068.jpg |120px|frameless ]]
|-
|-
|}
|}