Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions

Tigre (talk | contribs)
Tigre (talk | contribs)
Line 3: Line 3:
= Purpose, location and technical specifications =
= Purpose, location and technical specifications =


==Type and location of machine==
The JEOL JBX-9500FS electron beam lithography system is a spot electron beam lithography system designed for use in writing patterns (10 nm - 1 µm) in electron sensitive resists.
The JEOL JBX-9500FS electron beam lithography system is a spot electron beam lithography system designed for use in writing patterns (10 nm - 1 µm) in electron sensitive resists.


The JEOL JBX-9500FS was purchased in 2012 and is installed in E-1 and E-2 at DTU Danchip. The main console of the e-beam writer is installed in E-2 which is a class 10 (ISO 4) cleanroom with tight temperature and moisture control.


Substrates coated with resists are mounted in a cassette and transferred into the e-beam writer via the robot loader (autoloader). Even fully trained users are only authorized to mount substrates into the e-beam cassettes but '''not''' authorized to load the cassettes into the autoloader.
The computer controlling the e-beam (EWS/9500) and the computer supporting the conversion of e-beam files are located in E-1 which is a class 100 (ISO 5) cleanroom.


After your exposure, fully trained users can unload their cassettes from the autoloader, unmount their substrates and re-load an '''empty''' cassette into the autoloader.


If you are prohibited to unmount your substrates before another user requires the cassette, you must accept that either the next user or DTU Danchip personel unmount your substrates.
== Authorization ==


== Location ==
*Only authorized users are allowed to use this machine. You require at least 4 training sessions to be authorized.
<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual#top|Go to top of this page]]</span>
*No unauthorized users are allowed into the e-beam room E-2 unless they are accompanied with a member of DTU Danchip staff.
*In E-2, all users must keep within the area between the front side of the machine and the table with the pre-aligner setup. Only JEOL staff or DTU Danchip staff may access the backside of the machine.
*No users, not even authorised users, are allowed to load a substrate into the autoloader (robot loader).
*After your exposure, fully trained users can unload their cassettes from the autoloader, unmount their substrates and re-load an '''empty''' cassette into the autoloader.
*If you are prohibited to unmount your substrates before another user requires the cassette, you must accept that either the next user or DTU Danchip personel unmount your substrates.


The e-beam writer is located in a class 10 (ISO 4) cleanroom with tight temperature and moisture control. The room must only be entered when the machines or equipment inside the room is intended to be used. Always wear face-mask and an extra pair of gloves when handling cassettes.
Any violation of the above rules will result in eviction from the cleanroom.


The computer controlling the e-beam (EWS/9500) is located in the controller room which is a class 100 cleanroom area. The computers supporting the conversion of the e-beam files are also located in the controller room.
 
Manuals
 
 
 
 
==Manuals==


There are 3 manuals for the e-beam writer; apart from the main manual (this manual) there is a sdf and jdf-file manual, and a BEAMER manual. They can all 3 be accessed from LabAdviser or from LabManager under Technical documents.
There are 3 manuals for the e-beam writer; apart from the main manual (this manual) there is a sdf and jdf-file manual, and a BEAMER manual. They can all 3 be accessed from LabAdviser or from LabManager under Technical documents.