Specific Process Knowledge/Wafer cleaning/Cleaning with Soap Sonic: Difference between revisions

Revision as of 15:17, 7 March 2008 view source Mbe (talk \| contribs) danchip 35 edits →Cl[[Image:Sonic-clean.jpg\|300x300px\|thumb\|Soap sonic clean placed in the wash bench in the changing room. ]]eaning of wafers or chips that have been out of the cleanroom. ← Older edit		Revision as of 16:03, 21 October 2013 view source Kabi (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 1,146 edits No edit summary Newer edit →
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			'''Feedback to this page''': '''[mailto:wetchemistry@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/cleaning_with_Soap_Sonic click here]'''

	== Cl[[Image:Sonic-clean.jpg\|300x300px\|thumb\|Soap sonic clean placed in the wash bench in the changing room. ]]eaning of wafers or chips that have been out of the cleanroom. ==		== Cl[[Image:Sonic-clean.jpg\|300x300px\|thumb\|Soap sonic clean placed in the wash bench in the changing room. ]]eaning of wafers or chips that have been out of the cleanroom. ==