Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
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<gallery caption="" widths="1000px" heights=" | <gallery caption="" widths="1000px" heights="7000px" perrow="1"> | ||
image:multilayers222.jpg| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers. | image:multilayers222.jpg| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers. | ||
</gallery> | </gallery> | ||
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<b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b> | <b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b> | ||