Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

Revision as of 13:26, 20 May 2016 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,377 edits →Investigation of chemical composition in multilayers system ← Older edit		Revision as of 13:28, 20 May 2016 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,377 edits →Al2O3/TiO2 multilayers on high aspect ratio structures Newer edit →
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	<gallery caption="" widths="~~500px~~" heights="~~500px~~" perrow="2">		<gallery caption="" widths="1000px" heights="1000px" perrow="1">
	image:Evgeniy Shkondin Si trenches coverd with Al2O3 and TiO2 multilayers using ALD.JPG\| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers grown on silicon trenches.		image:Evgeniy Shkondin Si trenches coverd with Al2O3 and TiO2 multilayers using ALD.JPG\| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers grown on silicon trenches.