Specific Process Knowledge/Thin film deposition/ALD Picosun R200: Difference between revisions

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 *Al<sub>2</sub>O<sub>3</sub>
 *TiO<sub>2</sub>
-*Pt (not tested yet)
-Please note that it might not be possible to deposit all marials at the same time
 |-
 !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance
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 *Al<sub>2</sub>O<sub>3</sub>: ~ 0.88 - 0.97 nm/cycle (Using the "Al2O3" recipe, depending on the temperature)
-*TiO<sub>2</sub>: 0.04-0.05 nm/cycle
+*TiO<sub>2</sub>: 0.04-0.05 nm/cycle (Using the "TiO2" recipe, depending on the temperature)
-*Pt: Not measured
 |-
 |style="background:LightGrey; color:black"|Thickness
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 *Al<sub>2</sub>O<sub>3</sub>: 0 - 100 nm
-*TiO<sub>2</sub>: 0 - 100 nm
-*Pt: (not tested)
 |-
 !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range
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 *Al<sub>2</sub>O<sub>3</sub>: 150 - 350 <sup>o</sup>C
-*TiO<sub>2</sub>: 150-350  <sup>o</sup>C
-*Pt: (not tested)
 |-
 |style="background:LightGrey; color:black"|Precursors
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 *O<sub>3</sub>
 *O<sub>2</sub>
-*MeCpPtMe<sub>3</sub> (not mounted yet)
-Please note that not all precursors might be mounted on the tool at the same time
 |-
 !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates