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Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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<gallery caption="" widths="500px" heights="500px" perrow="2">
<gallery caption="" widths="500px" heights="500px" perrow="2">
image:Al2O3_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer.
image:TiO2_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer.
image:Al2O3_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer.
image:TiO2_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer.
</gallery>
</gallery>


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