Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

Revision as of 18:09, 19 May 2016 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Low temperature deposition of Al2O3 ← Older edit		Revision as of 18:10, 19 May 2016 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Low temperature deposition of TiO2 Newer edit →
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	Deposition rate: <b>0.048 nm/cycle </b>(@ 120 <sup>o</sup>C)		Deposition rate: <b>0.048 nm/cycle </b>(@ 120 <sup>o</sup>C)

	This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. The deposited TiO<sub>2</sub> layers are amorphous.		This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. The deposited TiO<sub>2</sub> layers are amorphous. Research related results with this recipe can be found here: [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK]