Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
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Deposition rate: <b>0.048 nm/cycle </b>(@ 120 <sup>o</sup>C) | |||
This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. The deposited TiO<sub>2</sub> layers are amorphous. | This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. The deposited TiO<sub>2</sub> layers are amorphous. | ||
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==Low temperature grown multilayers on flat surfaces== | ==Low temperature grown multilayers on flat surfaces== | ||