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Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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| align="center" |  
| align="center" |  
{| border="2" cellspacing="2" cellpadding="3"  align="center" style="width:750px"
{| border="2" cellspacing="2" cellpadding="3"  align="center" style="width:750px"
! colspan="5" |Deposition conditions at 120 <sup>o</sup>C for Al2O3 LT recipe
! colspan="5" |Deposition conditions at 120 <sup>o</sup>C for TiO2 LT recipe
|-
|-
!Number of cycles
!Number of cycles
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