Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

Revision as of 17:14, 19 May 2016 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Low temperature deposition of Al2O3 ← Older edit		Revision as of 17:18, 19 May 2016 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Low temperature deposition of Al2O3 Newer edit →
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	Deposition rate: <b>0.089 nm/cycle </b>(@120 <sup>o</sup>C)		Deposition rate: <b>0.089 nm/cycle </b>(@120 <sup>o</sup>C)

			This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature.