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Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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{| border="2" cellspacing="2" cellpadding="3" colspan="10"
{| border="2" cellspacing="2" cellpadding="3" colspan="10"
|bgcolor="#98FB98" |'''Al<sub>2</sub>O<sub>3</sub> deposition at 100 <sup>o</sup>C and 150 <sup>o</sup>C'''
|bgcolor="#98FB98" |'''Al<sub>2</sub>O<sub>3</sub> deposition at 120 <sup>o</sup>C'''
|-
|-
|
|
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| align="center" |  
| align="center" |  
{| border="2" cellspacing="2" cellpadding="3"  align="center" style="width:750px"
{| border="2" cellspacing="2" cellpadding="3"  align="center" style="width:750px"
! colspan="5" |Deposition conditions at 100 <sup>o</sup>C
! colspan="5" |Deposition conditions at 120 <sup>o</sup>C for Al2O3 LT recipe
|-
|-
!Number of cycles
!Number of cycles
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|-  
|-  
|150
|250
|14.11
|19.58
|2.18
|2.23
|0.225
|0.35
|1.56
|1.66
 
|-
|300
|25.94
|0.68
|0.14
|1.59


|-  
|-  
|500  
|500  
|41.35
|37.94
|1.87
|2.09
|0.60
|0.60
|1.59
|1.65


|-  
|-  
|800
|750
|65.05
|56.52
|2.28
|1.85
|1.13
|0.81
|1.59
|1.65


|-  
|-  
|1088
|1000
|87.25
|75.91
|2.15
|1.49
|1.35
|0.59
|1.60
|1.65
 
 


|-
|-
|}
|}


|-
|-
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|}
|}


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==Low temperature deposition of TiO<sub>2</sub>==
==Low temperature deposition of TiO<sub>2</sub>==
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