Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
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==Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers on high aspect ratio structures== | ==Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers on high aspect ratio structures== | ||
Recipe: Multi T | <b>Recipe: Multi T</b> | ||
Temperature: 150 <sup>o</sup>C | <b>Temperature: 150 <sup>o</sup>C</b> | ||
<gallery caption="" widths="500px" heights="500px" perrow="2"> | |||
image:Evgeniy Shkondin Si trenches coverd with Al2O3 and TiO2 multilayers using ALD.JPG| ALD-window for Al2O3 deposition. | |||
</gallery> | |||