Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
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==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>== | ==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>== | ||
Recipe: | <b>Recipe: Al2O3 LT</b> | ||
Temperature:80-150 <sup>o</sup>C | <b>Temperature:80-150 <sup>o</sup>C</b> | ||
{| border="2" cellspacing="2" cellpadding="5" align="none" | {| border="2" cellspacing="2" cellpadding="5" align="none" | ||
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!Pulse time | !Pulse time | ||
|0.1 s | |0.1 s | ||
|0. | |0.2 s | ||
|- | |- | ||
!Purge time | !Purge time | ||
| | |5.0 s | ||
| | |10.0 s | ||
|- | |- | ||
|} | |} | ||
Deposition rate: <b>0. | Deposition rate: <b>0.089 nm/cycle </b>(@120 <sup>o</sup>C) | ||
==Low temperature deposition of TiO<sub>2</sub>== | ==Low temperature deposition of TiO<sub>2</sub>== | ||