Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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= E-beam resists | = E-beam resists = | ||
<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography#top|Go to top of this page]]</span> | <span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography#top|Go to top of this page]]</span> | ||
== E-beam resists in the cleanroom == | |||
We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. | |||
* Find a blue-capped bottle in the cupboard next to office in 346 (outside the cleanroom). The cupboard says | |||
* Bring the bottle inside gowning; clean it thoroughly '''on the outside''' with water or alcohol | |||
* Bring the bottle to a fumehood inside the cleanroom; clean it thoroughly '''on the inside''' with the solvent. IF in doubt which solvent your e-beam resist is diluted in, read the MSDS of the resist to be found [[http://kemibrug.dk/searchpage/|here]]. | |||
== E-beam resists and Process flow == | |||
The table describes the e-beam resist used in the cleanroom for standard e-beam exposure. Some of resists are not provided by DTU Danchip and some are not yet approved for common use in the cleanroom and are currently being tested. If you wish to test some of these resists or other resists, please contact [mailto:lithography@danchip.dtu.dk Lithography]. | The table describes the e-beam resist used in the cleanroom for standard e-beam exposure. Some of resists are not provided by DTU Danchip and some are not yet approved for common use in the cleanroom and are currently being tested. If you wish to test some of these resists or other resists, please contact [mailto:lithography@danchip.dtu.dk Lithography]. | ||