Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

From LabAdviser
Eves (talk | contribs)
Eves (talk | contribs)
Line 29: Line 29:
Recipe: Multi T
Recipe: Multi T


Temperature: 150C
Temperature: 150 <sup>o</sup>C

Revision as of 15:19, 19 May 2016

This page describes non standart recipes including multilayers structures.

Low temperature deposition of Al2O3

Recipe: Al2O3LT

Temperature:80-150 oC

Low temperature deposition of TiO2

Recipe: TiO2LT

Temperature: 80-150 oC

Low temperature grown multilayers on flat surfaces

Recipe: EMA01

Recipe: EMA02

Recipe: EMA03

Recipe: EMA04

Temperature: 120 oC

Al2O3/TiO2 multilayers on high aspect ratio structures

Recipe: Multi T

Temperature: 150 oC