Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
Created page with "This page describes non standartv Al2O3 and tiO2 processes including multilayers structures" |
No edit summary |
||
| Line 1: | Line 1: | ||
This page describes non | This page describes non standart recipes including multilayers structures. | ||
==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>== | |||
Recipe: Al2O3LT | |||
Temperature:80-150C | |||
==Low temperature deposition of TiO<sub>2</sub>== | |||
Recipe: TiO2LT | |||
Temperature: 80-150C | |||
==Flat Low temperature grown multilayers== | |||
Recipe: EMA01 | |||
Recipe: EMA02 | |||
Recipe: EMA03 | |||
Recipe: EMA04 | |||
Temperature: 120C | |||
Revision as of 15:09, 19 May 2016
This page describes non standart recipes including multilayers structures.
Low temperature deposition of Al2O3
Recipe: Al2O3LT
Temperature:80-150C
Low temperature deposition of TiO2
Recipe: TiO2LT
Temperature: 80-150C
Flat Low temperature grown multilayers
Recipe: EMA01 Recipe: EMA02 Recipe: EMA03 Recipe: EMA04
Temperature: 120C