Specific Process Knowledge/Wafer cleaning/RCA: Difference between revisions
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==RCA cleaning== | ==RCA cleaning== | ||
[[Image:RCA_bench_cleanroom_2.jpg|300x300px|thumb|RCA bench: positioned in cleanroom 2. <br /> RCA1 - RCA2 - HF - | [[Image:RCA_bench_cleanroom_2.jpg|300x300px|thumb|RCA bench: positioned in cleanroom 2. <br /> RCA1 - RCA2 - HF - BHF(pre-dep wafers]] | ||
The RCA clean is used for cleaning the wafers before taking them into the furnaces and a few other equipments (check the cross contamination sheet). | The RCA clean is used for cleaning the wafers before taking them into the furnaces and a few other equipments (check the cross contamination sheet). | ||