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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By BGHE: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,321 edits
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==CF4==
==CF4==
I stopped trying with CF4 because I got bad selectivty  to the resist and decided to focus on the recipe with C4F8 instead.
{| border="1" cellspacing="1" cellpadding="2"  align="left"
{| border="1" cellspacing="1" cellpadding="2"  align="left"
! Parameter
! Parameter
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