Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon_oxide/By_Peixiong click here]''' | '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon_oxide/By_Peixiong click here]''' | ||
=With C4F8 and H2 chemistry= | =With C4F8 and H2 chemistry (tests done by Peixiong@nanolab)= | ||
==Part 1== | ==Part 1== | ||
{| class=MsoNormalTable border=0 cellspacing=0 cellpadding=0 width=855 style='width:641.0pt;border-collapse:collapse' style='height:36.0pt' | {| class=MsoNormalTable border=0 cellspacing=0 cellpadding=0 width=855 style='width:641.0pt;border-collapse:collapse' style='height:36.0pt' | ||