Specific Process Knowledge/Characterization/SEM LEO: Difference between revisions
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*[[Specific Process Knowledge/Lithography/EBeamLithography/RaithElphy|Raith Elphy e-beam lithography system]] | *[[Specific Process Knowledge/Lithography/EBeamLithography/RaithElphy|Raith Elphy e-beam lithography system]] | ||
===Typical current values=== | |||
Reported values are the average of five measurements from Elphy Quantum using the EBL holder's Faraday cup. All values in pA. | |||
{| border="1" style="text-align: center; width: 320px; height: 200px;" | |||
|- | |||
|colspan="6" style="text-align: center;" style="background: #efefef;" | '''LEO - Current measurements 11/02/2017''' | |||
|- | |||
!scope="row" | | |||
!|5kV | |||
!|10kV | |||
!|15kV | |||
!|20kV | |||
|- | |||
|- | |||
!10um | |||
|13 | |||
|17 | |||
|20.5 | |||
|25 | |||
|- | |||
|- | |||
!20um | |||
|62 | |||
|87 | |||
|105 | |||
|127 | |||
|- | |||
|- | |||
!30um | |||
|160 | |||
|175 | |||
|215 | |||
|264 | |||
|- | |||
!60um | |||
|510 | |||
|680 | |||
|850 | |||
|1040 | |||
|} | |||
==Equipment performance== | ==Equipment performance== | ||