Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions
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C4F8: Better selectivity to the resist mask can be achieved | C4F8: Better selectivity to the resist mask can be achieved | ||
[[/By BGHE|Tests done by Berit]] | *[[/By BGHE|Tests done by Berit]] | ||
[[/By Peixiong|Tests done by Peixiong]] | *[[/By Peixiong|Tests done by Peixiong]] | ||
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