Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong/images CF4: Difference between revisions

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==Images stepper_6A4_feb262013_step9==
==Images stepper_6A4_feb262013_step9==
<gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="14">
<gallery caption="6A4_feb262013_step9" widths="200px" heights="150px" perrow="14">
image:10mm from wf edge_087.jpg|wafer edge
image:10mm from wf edge_087.jpg|wafer edge
image:10mm from wf edge_088.jpg|wafer edge
image:10mm from wf edge_088.jpg|wafer edge
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==Stepper_6A5_feb272013==
==Stepper_6A5_feb272013==
<gallery caption="6A5_feb262013 step9 and step10" widths="200px" heights="150px" perrow="11">


==iamges 3==
Image:15mm from wf edge_163.jpg|Wafer edge
Image:15mm from wf edge_164.jpg|Wafer edge
Image:15mm from wf edge_165.jpg|Wafer edge
Image:15mm from wf edge_166.jpg|Wafer edge
Image:15mm from wf edge_167.jpg|Wafer edge
Image:15mm from wf edge_168.jpg|Wafer edge
Image:wf center_158.jpg|Wafer center
Image:wf center_159.jpg|Wafer center
Image:wf center_160.jpg|Wafer center
Image:wf center_161.jpg|Wafer center
Image:wf center_162.jpg|Wafer center
 
</gallery>
 
==images 3==
<gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="4">
 
</gallery>

Revision as of 10:33, 3 May 2016

Images stepper_6A1_feb262013_step9

Images stepper_6A4_feb262013_step9

Stepper_6A5_feb272013

images 3