Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong: Difference between revisions
| Line 4: | Line 4: | ||
=With C4F8 and H2 chemistry= | =With C4F8 and H2 chemistry= | ||
==Part 1== | |||
{| class=MsoNormalTable border=0 cellspacing=0 cellpadding=0 width=855 style='width:641.0pt;border-collapse:collapse' style='height:36.0pt' | {| class=MsoNormalTable border=0 cellspacing=0 cellpadding=0 width=855 style='width:641.0pt;border-collapse:collapse' style='height:36.0pt' | ||
| width=83 valign=top style='width:62.0pt;border:solid white 1.0pt; border-bottom:solid white 3.0pt;background:#4F81BD;padding:3.6pt 7.2pt 3.6pt 7.2pt; height:36.0pt' | | | width=83 valign=top style='width:62.0pt;border:solid white 1.0pt; border-bottom:solid white 3.0pt;background:#4F81BD;padding:3.6pt 7.2pt 3.6pt 7.2pt; height:36.0pt' | | ||
| Line 234: | Line 235: | ||
| width=79 style='width:59.0pt;border-top:none;border-left:none;border-bottom: solid white 1.0pt;border-right:solid white 1.0pt;background:#D0D8E8; padding:2.25pt 2.25pt 2.25pt 2.25pt;height:90.9pt' | | | width=79 style='width:59.0pt;border-top:none;border-left:none;border-bottom: solid white 1.0pt;border-right:solid white 1.0pt;background:#D0D8E8; padding:2.25pt 2.25pt 2.25pt 2.25pt;height:90.9pt' | | ||
|}<p class=MsoNormal> </p> | |}<p class=MsoNormal> </p> | ||
==Part2== | |||
=With CF4 and H2 chemistry= | =With CF4 and H2 chemistry= | ||