Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong/images CF4: Difference between revisions
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== | ==Images stepper_6A4_feb262013_step9== | ||
<gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="14"> | |||
image:10mm from wf edge_087.jpg|wafer edge | |||
image:10mm from wf edge_088.jpg|wafer edge | |||
image:10mm from wf edge_089.jpg|wafer edge | |||
image:10mm from wf edge_090.jpg|wafer edge | |||
image:10mm from wf edge_091.jpg|wafer edge | |||
image:10mm from wf edge_092.jpg|wafer edge | |||
image:10mm from wf edge_093.jpg|wafer edge | |||
image:20mm from wafer edge_098.jpg | |||
image:20mm from wafer edge_099.jpg | |||
image:wf cent_094.jpg|wafer center | |||
image:wf cent_095.jpg|wafer center | |||
image:wf cent_096.jpg|wafer center | |||
image:wf cent_097.jpg|wafer center | |||
</gallery> | |||
==Images 2== | ==Images 2== | ||
==iamges 3== | ==iamges 3== |