Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong/images CF4: Difference between revisions

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</gallery>
</gallery>


==images 1==
==Images stepper_6A4_feb262013_step9==
<gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="14">
image:10mm from wf edge_087.jpg|wafer edge
image:10mm from wf edge_088.jpg|wafer edge
image:10mm from wf edge_089.jpg|wafer edge
image:10mm from wf edge_090.jpg|wafer edge
image:10mm from wf edge_091.jpg|wafer edge
image:10mm from wf edge_092.jpg|wafer edge
image:10mm from wf edge_093.jpg|wafer edge
image:20mm from wafer edge_098.jpg
image:20mm from wafer edge_099.jpg
image:wf cent_094.jpg|wafer center
image:wf cent_095.jpg|wafer center
image:wf cent_096.jpg|wafer center
image:wf cent_097.jpg|wafer center
</gallery>


==Images 2==
==Images 2==


==iamges 3==
==iamges 3==

Revision as of 09:22, 3 May 2016

Images stepper_6A1_feb262013_step9

  • 6A1_feb262013_step9

Images stepper_6A4_feb262013_step9

  • 6A1_feb262013_step9
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer center
    wafer center
  • wafer center
    wafer center
  • wafer center
    wafer center
  • wafer center
    wafer center

Images 2

iamges 3

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