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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
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|-style="background:Black; color:White"
|-style="background:Black; color:White"
!Results  
!Results  
!Test on wafer with 50% load (Travka 50), by Peixiong Shi@danchip
!Test on ?" wafer, by Peixiong Shi@danchip
|-
|-
|Etch rate of thermal oxide
|Etch rate of thermal oxide
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