Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
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!style="background:silver; color:black;" align="center" width="60"|Purpose | !style="background:silver; color:black;" align="center" width="60"|Purpose | ||
|style="background:LightGrey; color:black"| Imaging and measurement of | |style="background:LightGrey; color:black" align="center" | Imaging and measurement of | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* Any (semi)conducting sample that may have thin (~ 5 µm <) layers of non-conducting materials on top | * Any (semi)conducting sample that may have thin (~ 5 µm <) layers of non-conducting materials on top | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | ||
|style="background:LightGrey; color:black" rowspan="2"|Resolution | |style="background:LightGrey; color:black" rowspan="2" align="center" |Resolution | ||
|style="background:Whitesmoke; color:black" colspan="5" align="center"| The resolution of a SEM is strongly dependent on the type of sample and the skills of the operator. The highest resolution is probably only achieved on special samples | |style="background:Whitesmoke; color:black" colspan="5" align="center"| The resolution of a SEM is strongly dependent on the type of sample and the skills of the operator. The highest resolution is probably only achieved on special samples | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics | !style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics | ||
|style="background:LightGrey; color:black"|Detectors | |style="background:LightGrey; color:black" align="center" |Detectors | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* Secondary electron (Se2) | * Secondary electron (Se2) | ||
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* CCD camera --> | * CCD camera --> | ||
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|style="background:LightGrey; color:black"|Stage | |style="background:LightGrey; color:black" align="center" |Stage | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* X, Y: 125 × 100 mm | * X, Y: 125 × 100 mm | ||
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* R: 360<sup>o</sup>--> | * R: 360<sup>o</sup>--> | ||
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|style="background:LightGrey; color:black" | |style="background:LightGrey; color:black" align="center" |Electron source | ||
|style="background:Whitesmoke; color:black" colspan="5" align="center"| FEG (Field Emission Gun) source | |||
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<!--|style="background:WhiteSmoke; color:black"| | <!--|style="background:WhiteSmoke; color:black"| | ||
* Tungsten filament--> | * Tungsten filament--> | ||
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|style="background:LightGrey; color:black"|Operating pressures | |style="background:LightGrey; color:black" align="center" |Operating pressures | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* Fixed at High vacuum (2 × 10<sup>-5</sup>mbar - 10<sup>-6</sup>mbar) | * Fixed at High vacuum (2 × 10<sup>-5</sup>mbar - 10<sup>-6</sup>mbar) | ||
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* High vacuum and Low vacuum--> | * High vacuum and Low vacuum--> | ||
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|style="background:LightGrey; color:black"|Options | |style="background:LightGrey; color:black" align="center" |Options | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* Raith Elphy Quantum E-Beam Litography system | * Raith Elphy Quantum E-Beam Litography system | ||
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* Focused ion beam (FIB) (Ga<sup>+</sup> ions)--> | * Focused ion beam (FIB) (Ga<sup>+</sup> ions)--> | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3" align="center" |Substrates | ||
|style="background:LightGrey; color:black"|Sample sizes | |style="background:LightGrey; color:black" align="center" |Sample sizes | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* Wafers up to 6" (only full view up to 4") | * Wafers up to 6" (only full view up to 4") | ||
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* Wafers won´t fit without a proper holder. The height of the sample is critical, should be as small, as possible--> | * Wafers won´t fit without a proper holder. The height of the sample is critical, should be as small, as possible--> | ||
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| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black" align="center" |Allowed materials | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* Any standard cleanroom material except graphene or CNT samples | * Any standard cleanroom material except graphene or CNT samples | ||
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<br clear="all" /> | <br clear="all" /> | ||
== Scanning electron microscopy at CEN [[image:Under_construction.png|50px]]== | == Scanning electron microscopy at CEN [[image:Under_construction.png|50px]]== | ||