Specific Process Knowledge/Characterization/SEM Supra 3: Difference between revisions
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* [http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=327| The SEM Supra 2 page in LabManager], | * [http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=327| The SEM Supra 2 page in LabManager], | ||
* [http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=361| The SEM Supra 3 page in LabManager], | * [http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=361| The SEM Supra 3 page in LabManager], | ||
==Equipment performance and process related parameters== | |||
{| border="2" cellspacing="0" cellpadding="2" | |||
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | |||
|style="background:WhiteSmoke; color:black"|<b>SEM Supra 2 (Supra 60VP SEM)</b> | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Purpose | |||
|style="background:LightGrey; color:black"|Imaging and measurement of | |||
|style="background:WhiteSmoke; color:black"| | |||
*Any sample except bulk insulators such as polymers, glass or quartz wafers | |||
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!style="background:silver; color:black;" align="center" width="60"|Location | |||
|style="background:LightGrey; color:black"| | |||
|style="background:WhiteSmoke; color:black"| | |||
*Cleanroom of DTU Danchip | |||
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!style="background:silver; color:black;" align="center" width="60"|Performance | |||
|style="background:LightGrey; color:black"|Resolution | |||
|style="background:WhiteSmoke; color:black"| | |||
*1-2 nm (limited by vibrations) | |||
The resolution is strongly dependent on the type of sample and the skills of the operator. | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics | |||
|style="background:LightGrey; color:black"|Detectors | |||
|style="background:WhiteSmoke; color:black"| | |||
*Secondary electron (Se2) | |||
*Inlens secondary electron (Inlens) | |||
*4 Quadrant Backscatter electron (QBSD) | |||
*Variable pressure secondary electron (VPSE) | |||
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|style="background:LightGrey; color:black"|Stage | |||
|style="background:WhiteSmoke; color:black"| | |||
*X, Y: 150 × 150 mm | |||
*T: -10 to 70<sup>o</sup> | |||
*R: 360<sup>o</sup> | |||
*Z: 50 mm | |||
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|style="background:LightGrey; color:black"|Electron source | |||
|style="background:WhiteSmoke; color:black"| | |||
*FEG (Field Emission Gun) source | |||
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|style="background:LightGrey; color:black"|Operating pressures | |||
|style="background:WhiteSmoke; color:black"| | |||
*Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar) | |||
*Variable at Low vacuum (0.1 mbar - 2 mbar) | |||
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|style="background:LightGrey; color:black"|Options | |||
|style="background:WhiteSmoke; color:black"| | |||
*Antivibration platform | |||
*Fjeld M-200 airlock taking up to 8" wafers | |||
*Oxford Instruments X-Max<sup>N</sup> 50 mm<sup>2</sup> SDD EDX detector and AZtec software package | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | |||
|style="background:LightGrey; color:black"|Batch size | |||
|style="background:WhiteSmoke; color:black"| | |||
*Up to 8" wafer with 6" view | |||
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| style="background:LightGrey; color:black"|Allowed materials | |||
|style="background:WhiteSmoke; color:black"| | |||
*Any standard cleanroom material | |||
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